| Applicable panel size | 850x1400(mm) - Max |
|---|---|
| Applicable panel | 8.0mm or more |
| Tact time | 250sec / 1 Mask |
| Cleaning power | Remove 99% or more of silica powder(1.6um or more) ※ According to CTS standard particle |
| Nozzle standard gap | 1.5 ~ 2.0mm |
| Moving type | Head moving |
| Power | AC208V 3P 60Hz / 50Hz |
| Mask supply | Manual cart / AGV |
| Foreign particle Detection Ability | 30um or more |
| Particle detection method | Line scan camera |
| Ultrasonic dry cleaning machine | An ultrasonic dry cleaner that cleans the photo mask of the stepper dry and touchless |
|---|---|
| Contamination prevention | Damage prevention for the photo mask |
| protection | Manage the foreign particles of the photo mask during the process |
| Defect reduction | Reducing the defects due to defective photo mask in the process |
